Title :
A micromachined W-band iris filter
Author :
Sammoura, Firas ; Cai, Ying ; Chi, Chen-Yu ; Hirano, Toshiki ; Lin, Liwei ; Chiao, Jung-Chih
Author_Institution :
Dept. of Mech. Eng., California Univ., Berkeley, CA, USA
Abstract :
A micromachined W-band iris filter was successfully demonstrated using micro hot embossing and selective electroplating technologies. The filter design follows the insertion loss method with a Chebyshev polynomial to synthesize the desired spectral responses and numerical simulations were performed using the finite-element tool, high frequency structure simulator (HFSS), to study the effects of iris thickness on the bandwidth and center frequency. The measured prototype filter performance has a transmission loss of -3.49 dB and a return loss of -18 dB at the resonant frequency of 95 GHz. The filter has a bandwidth of 3.5 GHz and a rejection loss of better than -50 dB, while the loaded quality factor is 27.27. This plastic, low-cost manufacturing process opens up opportunities in replacing the expensive metallic components and integrated 3D manufacturing for current and future millimeter-wave systems.
Keywords :
Chebyshev filters; Q-factor; band-pass filters; electroplating; embossing; micromachining; millimetre wave filters; rectangular waveguides; waveguide filters; 18 dB; 3.49 dB; 3.5 GHz; 50 dB; 95 GHz; Chebyshev polynomial; HFSS; insertion loss method; iris thickness effects; loaded quality factor; micro hot embossing; micromachined W-band filter; plastic manufacturing process; rectangular waveguide iris filter; selective electroplating; Bandwidth; Chebyshev approximation; Embossing; Filters; Frequency synthesizers; Insertion loss; Iris; Manufacturing processes; Polynomials; Propagation losses;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN :
0-7803-8994-8
DOI :
10.1109/SENSOR.2005.1496640