A technique for depositing metal layers over large areas for EMI shielding

Author

Bhatia, M.S.

Author_Institution

Div. of Laser & Plasma Technol., Bhabha Atomic Res. Centre, Bombay, India

fYear

1995

Firstpage

321

Lastpage

324

Abstract

Shielding by metal enclosures are now used routinely to guard against electromagnetic fields. The mechanism responsible for shielding in such enclosures is easy to understand-reflection and absorption. Whereas the mechanism is simple, the implementation of this idea is rarely a simple task. Given the variety of geometries, fields and shield materials, one is forced to innovate. Thus, novel solutions towards construction of electromagnetic shield enclosures are sought. This paper presents the merits and demerits of a method that can be used to obtain metallic shields

Keywords

coating techniques; electromagnetic interference; electromagnetic shielding; materials preparation; metallic thin films; EMI shielding; Faraday cage; absorption; depositing metal layers; electromagnetic fields; electromagnetic shield enclosures; mechanism; metal enclosures; metallic shields; reflection; thin films; Atherosclerosis; Chemical vapor deposition; Electromagnetic fields; Electromagnetic interference; Electron beams; Geometry; Sheet materials; Substrates; Thermal spraying; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Electromagnetic Interference and Compatibility, 1995., International Conference on

Conference_Location

Madras

Print_ISBN

0-7803-3229-6

Type

conf

DOI

10.1109/ICEMIC.1995.501604

Filename

501604