DocumentCode :
1724900
Title :
On the technology and ecosystem of 3D / TSV manufacturing
Author :
Hummler, Klaus ; Smith, Larry ; Caramto, Raymond ; Edgeworth, Robert ; Olson, Stephen ; Pascual, Daniel ; Qureshi, Jamal ; Rudack, Andy ; Quon, Roger ; Arkalgud, Sitaram
Author_Institution :
3D Interconnect Div., SEMATECH, Albany, NY, USA
fYear :
2011
Firstpage :
1
Lastpage :
6
Abstract :
Three-dimensional (3D) die stacking using through silicon via (TSV) promises significant improvements in performance, power consumption and size over traditional edge-connected die stacking (e.g. wire bonds) or package-on-package (PoP) based approaches. 3D integrated circuits (3D-IC) using TSV will enable new system in package (SiP) applications, especially where ultra-high memory bandwidth at moderate power consumption is needed. This paper describes the technology elements for a successful implementation of TSV in high volume manufacturing (HVM) with special focus on the so-called “TSV mid” integration flow being developed at SEMATECH. The maturity and readiness of each process module for HVM is assessed. In addition to technological feasibility and manufacturing readiness, 3D-IC adoption requires an environment of agreed upon specifications, standards, and tools (3D ecosystem). Progress toward a well defined 3D ecosystem by SEMATECH and many other organizations is described in part III of this paper.
Keywords :
integrated circuit manufacture; low-power electronics; system-in-package; three-dimensional integrated circuits; 3D ecosystem; 3D integrated circuits; 3D-IC; 3D-TSV manufacturing; SEMATECH; TSV mid integration flow; high volume manufacturing; power consumption; system in package; three-dimensional die stacking; through silicon via technology; ultra-high memory bandwidth; Copper; Packaging; Silicon; Stacking; Three dimensional displays; Through-silicon vias; 3D; TSV; TSV mid; manufacturing readiness; standards;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI
Conference_Location :
Saratoga Springs, NY
ISSN :
1078-8743
Print_ISBN :
978-1-61284-408-4
Electronic_ISBN :
1078-8743
Type :
conf
DOI :
10.1109/ASMC.2011.5898174
Filename :
5898174
Link To Document :
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