DocumentCode :
1725171
Title :
Substrate cleaning using ultrasonics/megasonics
Author :
Kazemi, Mohammad ; Treichel, Helmuth ; Ligutom, Rito
Author_Institution :
Xyratex Int. Inc., Fremont, CA, USA
fYear :
2011
Firstpage :
1
Lastpage :
6
Abstract :
The adhesion and detachment forces acting on spherical particles attached to a substrate is investigated. It is found that alumina particles larger than 50 nm and glass particles larger than 10 nm can be successfully dislodged by acoustic waves in an ultrasonic tank. Inspection of detachment forces reveals that the dominant detachment force is acoustic cavitation force for particles larger than 35 nm (f = 950 kHz).
Keywords :
acoustic waves; adhesion; alumina; cavitation; glass; inspection; ultrasonic cleaning; Al2O3; SiO2; acoustic cavitation force; acoustic waves; adhesion forces; alumina particles; detachment forces; frequency 950 kHz; glass particles; inspection; megasonics; spherical particles; substrate cleaning; ultrasonic tank; Acoustics; Adhesives; Equations; Force; Mathematical model; Substrates; Transducers; Acoustic Cavitation; Acoustic streaming; Particle Removal; Ultrasonics/Megasonics; Van der Waals Force;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI
Conference_Location :
Saratoga Springs, NY
ISSN :
1078-8743
Print_ISBN :
978-1-61284-408-4
Electronic_ISBN :
1078-8743
Type :
conf
DOI :
10.1109/ASMC.2011.5898185
Filename :
5898185
Link To Document :
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