DocumentCode :
1725341
Title :
2010 VLSI technology symposium
fYear :
2010
Firstpage :
1
Lastpage :
2
Abstract :
The following topics are dealt with: VLSI technology; advanced CMOS; reliability; stability; MRAM; x-point RRAM; ultra thin body FDSOI; process technology; 3D integration; NAND flash memory; design enablement; heterogenous integration; DRAM; PCRAM; and GeMOSFET.
Keywords :
CMOS integrated circuits; MOSFET; VLSI; integrated circuit design; integrated circuit reliability; random-access storage; silicon-on-insulator; stability; 3D integration; DRAM; GeMOSFET; MRAM; NAND flash memory; PCRAM; VLSI technology; advanced CMOS; design enablement; heterogenous integration; process technology; reliability; stability; ultra thin body FDSOI; x-point RRAM;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology (VLSIT), 2010 Symposium on
Conference_Location :
Honolulu
Print_ISBN :
978-1-4244-5451-8
Type :
conf
DOI :
10.1109/VLSIT.2010.5556141
Filename :
5556141
Link To Document :
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