DocumentCode :
1725864
Title :
ISPSD ´07 Charitat Award; Split-Gate Resurf Stepped Oxide (RSO) MOSFETS for 25V Applications with Record Low Gate-to-Drain Charge
Author :
Goarin, P. ; Koops, G.E.J. ; van Dalen, R. ; LeCam, C. ; Saby, J.
Author_Institution :
NXP Semiconductors Kapeldreef 75 B-3001 Leuven Belgium
fYear :
2008
Abstract :
This paper presents a split-gate version of the Resurf Stepped Oxide (RSO) MOSFET. Splitting the gate enables a drastic reduction of the gate-to-drain capacitance intrinsic to the RSO device concept while keeping all the benefits of the RESURF effect. We achieved a record on-resistance of 3.8 m??mm2 and gate-to-drain charge of 0.9 nCmm2 at a breakdown voltage of 35V for a pitch of 1.3 mm (0.8 mm trench width). The switching losses of our split-gate RSO MOSFET are 4 times better than the best published data in the same voltage range.
Keywords :
MOSFET;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and IC's, 2008. ISPSD '08. 20th International Symposium on
Conference_Location :
Orlando, FL
Print_ISBN :
978-1-4244-1532-8
Type :
conf
DOI :
10.1109/ISPSD.2008.4538879
Filename :
4538879
Link To Document :
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