Title :
SRAM with c-axis aligned crystalline oxide semiconductor: Power leakage reduction technique for microprocessor caches
Author :
Ishizu, Takahiko ; Kato, Kazuhiko ; Onuki, Tatsuya ; Matsuzaki, Takaomi ; Tamura, H. ; Ohmaru, T. ; Uesugi, Wataru ; Isobe, Atsuo ; Ohshima, K. ; Tochibayashi, Katsuaki ; Nei, Kato ; Noda, Kentaro ; Tsutsui, Naoya ; Atsumi, T. ; Shionoiri, Y. ; Goto, Gens
Author_Institution :
Semicond. Energy Lab. Co., Ltd., Atsugi, Japan
Abstract :
SRAM with backup circuits using a crystalline oxide semiconductor (OS) (e.g., a c-axis aligned crystalline oxide semiconductor (CAAC-OS) typified by CAAC In-Ga-Zn oxide (CAAC-IGZO)) is reported. Results of cell-level simulation based on 45-nm Si/100-nm OS process technology show backup time of 3.9 ns, recovery time of 2.0 ns, and break-even time of 21.7 ns. The OS-SRAM cell can replace a standard-SRAM cell without area overhead, which does not significantly affect normal operation. A 32-bit microprocessor test chip (350-nm Si/180-nm OS technology) with cache memory including the OS-SRAM was fabricated to demonstrate the intended normal and power-gating operations. The test chip demonstrated 97.6% standby power saving.
Keywords :
SRAM chips; cache storage; gallium compounds; indium compounds; low-power electronics; microprocessor chips; In-Ga-Zn; OS-SRAM cell; c-axis aligned crystalline oxide semiconductor; cache memory; microprocessor caches; microprocessor test chip; power gating; power leakage reduction; size 100 nm; size 180 nm; size 350 nm; size 45 nm; time 2.0 ns; time 21.7 ns; time 3.9 ns; word length 32 bit; Arrays; Cache memory; Capacitors; Microprocessors; Nonvolatile memory; Random access memory; Silicon; SRAM; cache memory; low power; oxide semiconductor; power-gating;
Conference_Titel :
Memory Workshop (IMW), 2014 IEEE 6th International
Conference_Location :
Taipei
Print_ISBN :
978-1-4799-3594-9
DOI :
10.1109/IMW.2014.6849376