DocumentCode :
1726325
Title :
A new approach for improving operating margin of unipolar ReRAM using local minimu m of reset voltage
Author :
Sakotsubo, Y. ; Terai, M. ; Kotsuji, S. ; Saito, Y. ; Tada, M. ; Yabe, Y. ; Hada, H.
Author_Institution :
Device Platforms Res. Labs., NEC Corp., Sagamihara, Japan
fYear :
2010
Firstpage :
87
Lastpage :
88
Abstract :
We propose a new approach for improving the operating margin of Ta2O5/plasma oxidized TiO2 stacked unipolar ReRAM. It was found that the reset voltage (switching from low resistance state to high resistance state) can be minimized by using local minimum against the resistance of the low resistance state. In addition, weakening the plasma oxidation condition reduced the power consumption and the variation of reset voltage. Excellent operating margin and more than 105 switching cycle times was successfully demonstrated using the integrated device.
Keywords :
random-access storage; tantalum compounds; Ta2O5; local minimum; plasma oxidation condition; power consumption; reset voltage; unipolar ReRAM; Arrays; Fitting; Guidelines; Oxidation; Plasmas; Resistance; Switches; Unipolar ReRAM; non-volatile memory; switching mechanism; switching model; tunnel barrier;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology (VLSIT), 2010 Symposium on
Conference_Location :
Honolulu
Print_ISBN :
978-1-4244-5451-8
Electronic_ISBN :
978-1-4244-5450-1
Type :
conf
DOI :
10.1109/VLSIT.2010.5556181
Filename :
5556181
Link To Document :
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