Title :
Mass-loaded cantilevers with suppressed higher-order modes for magnetic resonance force microscopy
Author :
Chui, B.W. ; Hishinuma, Y. ; Budakian, R. ; Mamin, H.J. ; Kenny, T.W. ; Rugar, D.
Author_Institution :
IBM Res. Div., Almaden Res. Center, San Jose, CA, USA
Abstract :
We describe the design, fabrication and testing of mass-loaded cantilevers for electron-spin magnetic resonance force microscopy. These single-crystal silicon cantilevers are designed to have large gaps in their thermal mode spectra so as to reduce thermal noise near the electron-spin Rabi frequency. Each cantilever typically consists of a 2 /spl mu/m thick mass suspended at the end of a 0.1 /spl mu/m thick hinge. The fabrication process starts with an SOI wafer followed by selective silicon epitaxy, cantilever patterning, and backside release. The focus of the process is on precise thickness control and material homogeneity. We will present characterization results for these cantilevers at room and low temperatures and discuss the impact of these devices on magnetic resonance force microscopy measurements.
Keywords :
elemental semiconductors; force sensors; magnetic force microscopy; magnetic noise; paramagnetic resonance; semiconductor epitaxial layers; silicon; 0.1 micron; 2 micron; 293 to 298 K; SOI wafer; Si; electron spin Rabi frequency; electron spin magnetic resonance force microscopy; mass loaded cantilever; room temperature; silicon crystal cantilever; silicon epitaxy; thermal mode spectra; thermal noise; Electron microscopy; Fabrication; Force measurement; Frequency; Magnetic force microscopy; Magnetic noise; Magnetic resonance; Noise reduction; Silicon; Testing;
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7731-1
DOI :
10.1109/SENSOR.2003.1216966