DocumentCode :
1726869
Title :
Ultra-high I/O density glass/silicon interposers for high bandwidth smart mobile applications
Author :
Kumar, Gokul ; Bandyopadhyay, Tapobrata ; Sukumaran, Vijay ; Sundaram, Venky ; Lim, Sung Kyu ; Tummala, Rao
fYear :
2011
Firstpage :
217
Lastpage :
223
Abstract :
Smart mobile applications are driving the demand for higher logic-to-memory bandwidth (BW) in 10-30 GB/s range with lower power consumption and larger memory capacity. This paper presents a radically-different, scalable and lower cost approach than the 3D ICs with TSV stack approach being pursued widely, to achieve high bandwidth. This approach is referred to as interposer approach using ultra-thin glass or silicon with ultra-high I/O density interposers, which does not require TSVs in the logic IC in the 3D stack. This paper presents a comparative study, based on electrical modeling of the logic-to-memory signal path, in various current and emerging package configurations for use in smart mobile devices. Frequency and time domain analysis for each of these scenarios is performed using both chip and package-level models with varying interconnection dimensions. Simulated eye diagrams for the complete data paths in the thin glass interposer approach demonstrated more than 3 Gbps/pin data rate, similar to 3D ICs.
Keywords :
DRAM chips; frequency-domain analysis; mobile communication; three-dimensional integrated circuits; time-domain analysis; electrical modeling; frequency domain analysis; high bandwidth smart mobile applications; time domain analysis; ultra high I/O density glass/silicon interposers; Bandwidth; Delay; Glass; Silicon; Three dimensional displays; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st
Conference_Location :
Lake Buena Vista, FL
ISSN :
0569-5503
Print_ISBN :
978-1-61284-497-8
Electronic_ISBN :
0569-5503
Type :
conf
DOI :
10.1109/ECTC.2011.5898516
Filename :
5898516
Link To Document :
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