• DocumentCode
    1727089
  • Title

    Development of Super Thin TSV PoP

  • Author

    Yoon, Seung Wook ; Ishibashi, Kazuo ; Dzafir, Shariff ; Prashant, Meenakshi ; Marimuthu, Pandi Chelvam ; Carson, Flynn

  • Author_Institution
    STATS ChipPAC Ltd., Singapore, Singapore
  • fYear
    2011
  • Firstpage
    274
  • Lastpage
    278
  • Abstract
    One of the hottest topics in the semiconductor industry today is a 3D packaging using Through Silicon Via (TSV) technology. Driven by the need for improved electrical performance or the reduction of timing delays, methods to use short vertical interconnects have been developed to replace the long interconnects found in 2D packaging. 3D TSV interposer is an efficient and practical approach to solving die integration challenges. Many microsystem devices that will have to move to wafer-level packages will also facilitate further integration using silicon TSV interposers. This paper will address TSV interposer development for mobile applications to replace normal organic laminate substrate. Major driver of this work is for PoP thickness reduction since current organic PoP is one of the thickest components in cellular phone engine. Super Thin PoP test vehicle was designed in order to prove the viability of this technology. This test vehicle was a 12×12mm package with 0.4mm ball pitch on the bottom and 0.4mm pitch between the top and bottom PoP package. Test vehicle has 0.1mm thick TSV substrate and bare-die flip-chip, achieving 0.7mm total stackup height vs. equivalent organic PoP of ~1.5mm. This paper will highlight the TSV interposer test vehicle design, fabrication, assembly process development, warpage behavior study with simulation and experiments, component level reliability test results of the Super Thin PoP test vehicle and future steps.
  • Keywords
    electronics packaging; flip-chip devices; integrated circuit interconnections; integrated circuit reliability; three-dimensional integrated circuits; wafer level packaging; 3D TSV interposer; 3D packaging; PoP thickness reduction; TSV PoP; assembly process development; cellular phone engine; flip-chip; microsystem devices; organic laminate substrate; reliability; semiconductor industry; through silicon via technology; timing delays; vertical interconnects; wafer-level packages; warpage behavior; Copper; Reliability; Silicon; Substrates; Temperature measurement; Three dimensional displays; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st
  • Conference_Location
    Lake Buena Vista, FL
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-61284-497-8
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2011.5898525
  • Filename
    5898525