DocumentCode
1727584
Title
State of the Art 10 kV NMOS Transistors
Author
Das, Mrinal K. ; Callanan, Robert ; Capell, D. Craig ; Hull, Brett ; Husna, Fatima ; Richmond, James ; O´loughlin, Michael ; Paisley, Michael J. ; Powell, Adrian ; Zhan, Qingchun
Author_Institution
Power R&D Devices Cree, Inc., Durham, NC
fYear
2008
Firstpage
253
Lastpage
255
Abstract
Rapidly improving 4 H-SiC material quality and a maturing MOS process/design have enabled the development of the largest 10 kV MOSFET to date and the first 10 kV n-IGBT capable of flowing 10 A and 4 A, respectively, with very low on- resistances. With 20 V on the gate, both devices have aVp~ 5V with a positive temperature coefficient for on-resistance that facilitates their use in a parallel configuration. Each device has its own advantages. The conductivity modulated n-IGBT offers higher current density operation (up to 100 A/cm ) while the majority carrier MOSFET offers extremely fast 5 kV switching with only 140 nsec of turn-off time and a manageable 160 W/cm of dissipated power at 20 kHz. These exciting results indicate that the 10 kV SiC NMOS switches may potentially revolutionize emerging high voltage, high frequency power electronics.
Keywords
field effect transistor switches; insulated gate bipolar transistors; power MOSFET; silicon compounds; wide band gap semiconductors; NMOS switches; NMOS transistors; SiC; current 10 A; current 4 A; field effect transistor switches; frequency 20 kHz; insulated gate bipolar transistors; time 140 ns; voltage 10 kV; voltage 20 V; voltage 5 V; Conductivity; Current density; Energy management; MOS devices; MOSFET circuits; Power MOSFET; Process design; Silicon carbide; Switches; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and IC's, 2008. ISPSD '08. 20th International Symposium on
Conference_Location
Orlando, FL
Print_ISBN
978-1-4244-1532-8
Electronic_ISBN
978-1-4244-1533-5
Type
conf
DOI
10.1109/ISPSD.2008.4538946
Filename
4538946
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