• DocumentCode
    1728068
  • Title

    Thick silicon membrane technology for reliable and high performance operation of high voltage LIGBTs in Power ICs

  • Author

    Trajkovic, T. ; Udrea, F. ; Lee, C. ; Udugampola, N. ; Pathirana, V. ; Mihaila, A. ; Amaratunga, G.A.J.

  • Author_Institution
    Cambridge Semicond. Ltd. - CamSemi, Cambridge
  • fYear
    2008
  • Firstpage
    327
  • Lastpage
    330
  • Abstract
    A step change in performance and reliability of thick SOI membrane devices compared to earlier generation of devices on ultra-thin SOI membranes is reported in here. The membrane concept first reported offered a landmark improvement in the trade-off between switching losses and breakdown capability (in excess of 700V) but its current capability was limited by the thickness of the silicon membrane (around 30 A/cm2 for LIGBTs on 0.25 mum silicon membranes, achieving a loss related power density approaching 100 W/cm2 ). This paper reports on membrane power devices with current densities which approach the best of those offered by vertical devices (current density greater than 100 A/cm with power density of 180 W/cm2 ), without sacrificing switching speed (toff < 60 ns for 1.5 mum membranes). HTRB results showing 1000 h+ operation at 125degC at 80% of the rated voltage are also presented. Finally, it is shown that both the static and dynamic high temperature operation of thick membrane LIGBTs is superior to that of state-of-the-art integrated LDMOSFETs.
  • Keywords
    MOSFET; insulated gate bipolar transistors; power integrated circuits; silicon-on-insulator; LDMOSFET; SOI membrane devices; lateral insulated gate bipolar transistor; power IC; Biomembranes; Current density; Electric breakdown; Isolation technology; Plasma temperature; Power generation; Power integrated circuits; Semiconductor device reliability; Silicon on insulator technology; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and IC's, 2008. ISPSD '08. 20th International Symposium on
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    978-1-4244-1532-8
  • Electronic_ISBN
    978-1-4244-1533-5
  • Type

    conf

  • DOI
    10.1109/ISPSD.2008.4538965
  • Filename
    4538965