DocumentCode
1728137
Title
Fabrication of nanochannels using glass to glass anodic bonding
Author
Kutchoukov, V.G. ; Laugere, F. ; van der Vlist, W. ; Pakula, L. ; Garini, Y. ; Alkemade, P.F.A. ; Bossche, A.
Author_Institution
Dept. of Micro-Electron., Delft Univ. of Technol., Netherlands
Volume
2
fYear
2003
Firstpage
1327
Abstract
In this work, we present a technology for fabrication of nanochannels created in glass with which bio-analysis can be performed in combination with fluorescence microscopy. The technology is based on a glass-to-glass anodic bonding process. In the bonding process, an intermediate layer (thin insulating film) is deposited on one of the two glass wafers. The channel is then defined, with one photo-patterning step, in the intermediate layer. In our approach, a 33 nm thick amorphous silicon layer (deposited by LPCVD) was used as an intermediate layer. The depth of the channel is defined during the etching of this layer.
Keywords
amorphous semiconductors; chemical vapour deposition; elemental semiconductors; etching; fluorescence; nanostructured materials; nanotechnology; semiconductor thin films; silicon; wafer bonding; 33 nm; LPCVD; amorphous silicon layer; etching; fluorescence microscopy; glass wafers; glass-glass anodic bonding; intermediate layer; low-pressure chemical vapour deposition; nanochannels fabrication; photo-patterning; thin insulating film; Amorphous silicon; Etching; Fluorescence; Glass; Microscopy; Nanobioscience; Optical device fabrication; Optical films; Optical imaging; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7731-1
Type
conf
DOI
10.1109/SENSOR.2003.1217018
Filename
1217018
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