Title :
Thickness control by ion beam milling in acoustic resonator devices
Author :
Mishin, Sergey ; Oshmyansky, Yury ; Bi, Frank
Author_Institution :
AMSystems, Inc., Goleta, CA, USA
Abstract :
In this paper, practical aspects of production worthy methods for film uniformity adjustment (trimming) used in manufacturing of Film Bulk Acoustic Resonator (FBAR) filters have been presented. Two-step trimming in conjunction with thickness "smoothing" technique control total thickness range to within less than 8 A on product wafers with variable surface film etch rates even with difficult to measure film thickness. Trimming processes were used to allow using one wafer from a batch to provide compensation feedback in the FBAR devices. Combining ion mill with deposition in the same tool produces <;0.1% uniformity in the deposited films.
Keywords :
acoustic resonator filters; electronics industry; ion beam applications; milling; thickness control; FBAR filters; acoustic resonator devices; compensation feedback; film bulk acoustic resonator filter manufacturing; film uniformity adjustment methods; ion beam milling; ion mill deposition; product wafers; production worthy methods; thickness smoothing technique control; two-step trimming process; variable surface film etch rates; Aluminum; Film bulk acoustic resonators; Films; Ion beams; Ion sources; Surface treatment;
Conference_Titel :
Frequency Control Symposium (FCS), 2010 IEEE International
Conference_Location :
Newport Beach, CA
Print_ISBN :
978-1-4244-6399-2
DOI :
10.1109/FREQ.2010.5556249