Title :
Thin film resistor technology and noise reliability indicators
Author_Institution :
Phys. Dept., Tech. Univ. Brno, Czech Republic
Abstract :
Low-frequency noise reliability indicator CQ=Su f/U2 for thin film resistors is introduced and its applicability is demonstrated with the use of experimental data. Dispersions of the noise reliability indicator and frequency exponent of large ensembles of resistors manufactured by Japanese, US and European producers are compared with the aim to assess the production technology level. Correlation of results is presented
Keywords :
electron device noise; noise; reliability; thin film resistors; LF noise; low-frequency noise; noise reliability indicators; thin film resistor technology; Charge carriers; Fluctuations; Frequency; Low-frequency noise; Manufacturing; Noise shaping; Resistors; Space technology; Transistors; Voltage;
Conference_Titel :
Microelectronics, 1997. Proceedings., 1997 21st International Conference on
Conference_Location :
Nis
Print_ISBN :
0-7803-3664-X
DOI :
10.1109/ICMEL.1997.632932
