• DocumentCode
    1728483
  • Title

    The effects of injection induced bandgap narrowing on bipolar transistors operating at low temperatures

  • Author

    Cressler, John D. ; Tang, D.D. ; Yang, Edward S.

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    1989
  • Firstpage
    28
  • Lastpage
    32
  • Abstract
    The authors present evidence that injection-induced bandgap-narrowing plays an important role in determining the low-temperature characteristics of bipolar transistors. The transistors used for the investigation were scaled double-polysilicon self-aligned devices that have yielded sub-200 pS ECL (emitter coupled logic) gate delays at LN/sub 2/ temperature. The bandgap-narrowing phenomenon is shown to occur when a high density of free carriers is injected into the neutral base region of the device under high-current conditions; the net result is a significant enhancement in the low-temperature current gain that is unaccounted for in conventional device theory. This perturbation of the low-temperature device properties must be carefully considered for accurate device and circuit modelling.<>
  • Keywords
    bipolar transistors; cryogenics; energy gap; semiconductor device models; 77 K; ECL gate delays; bipolar transistors; current gain; free carrier density; high-current conditions; injection induced bandgap narrowing; low temperatures; modelling; scaled double-polysilicon self-aligned devices; Bipolar transistors; CMOS technology; Current measurement; Doping; Equations; Photonic band gap; Plasma temperature; Silicon; Temperature distribution; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Low Temperature Semiconductor Electronics, 1989., Proceedings of the Workshop on
  • Conference_Location
    Burlington, VT, USA
  • Type

    conf

  • DOI
    10.1109/LTSE.1989.50176
  • Filename
    50176