Title :
MEMS-based X-ray optics for future astronomical missions
Author :
Ezoe, Y. ; Mitsuishi, I. ; Ishizu, K. ; Moriyama, T. ; Mitsuda, K. ; Yamasaki, N.Y. ; Ohashi, T. ; Horade, M. ; Sugiyama, S. ; Riveros, R.E. ; Boggs, T. ; Yamaguchi, H. ; Kanamori, Y. ; Gabriel, N.T. ; Talghader, J.J. ; Morishita, K. ; Nakajima, K. ; Maed
Author_Institution :
Tokyo Metropolitan Univ., Tokyo, Japan
Abstract :
X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high-performance optical systems. Curvilinear micropores vertical to a thin wafer are made by using DRIE (Deep Reactive Ion Etching) or X-ray LIGA. The side walls are smoothed by using magnetic field assisted finishing and annealing technologies in order that the walls can reflect X-rays. Two or four such wafers are bent to spherical shapes with different curvature of radii and stacked, to focus parallel X-rays from astronomical objects by multiple reflections. In this paper, the concept and recent advances of the MEMS X-ray optics are reviewed.
Keywords :
X-ray apparatus; X-ray optics; astronomical telescopes; finishing; magnetic annealing; micro-optomechanical devices; optical fabrication; sputter etching; MEMS-based X-ray optics; X-ray LIGA; curvilinear micropores; deep reactive ion etching; magnetic field annealing; magnetic field assisted finishing; Micromechanical devices; Mirrors; Optical device fabrication; Optical diffraction; Optical imaging; X-ray imaging;
Conference_Titel :
Optical MEMS and Nanophotonics (OPT MEMS), 2010 International Conference on
Conference_Location :
Sapporo
Print_ISBN :
978-1-4244-8926-8
DOI :
10.1109/OMEMS.2010.5672121
