Design and fabrication of dielectric nanostructured Luneburg lens in optical frequencies

Author

Takahashi, Satoshi ; Chang, Chih-Hao ; Yang, Se Young ; Barbastathis, George

Author_Institution

Massachusetts Inst. of Technol., Cambridge, MA, USA

fYear

2010

Firstpage

179

Lastpage

180

Abstract

A dielectric subwavelength Luneburg lens structure was designed using Hamiltonian ray tracing, and fabricated using electron beam lithography. Analysis from Hamiltonian ray tracing was in agreement with finite difference in time domain (FDTD) method with wavefront error between the two methods below λ/8, while an improvement in speed of approximately 100 times was observed. The fabricated Luneburg lens structure was tested with a fiber laser with a wavelength of λ=1.55μm, and proved its capabilities of focusing.

Keywords

electron beam lithography; lenses; nanolithography; nanophotonics; nanostructured materials; optical design techniques; optical fabrication; optical focusing; ray tracing; FDTD; Hamiltonian ray tracing; dielectric subwavelength nanostructured Luneburg lens; electron beam lithography; finite difference time domain method; focusing; optical design; optical fabrication; wavefront error; Adaptive optics; Dielectrics; Fiber optics; Indexes; Lenses; Optical device fabrication;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics (OPT MEMS), 2010 International Conference on

Conference_Location

Sapporo

Print_ISBN

978-1-4244-8926-8

Electronic_ISBN

978-1-4244-8925-1

Type

conf

DOI

10.1109/OMEMS.2010.5672127

Filename

5672127