Elastomer spatial light modulators for extreme ultraviolet lithography

In this paper, we present an elastomer spatial light modulator (SLM) that can be scaled to meet the requirements of extreme ultraviolet (EUV- 13 nm wavelength) maskless lithography. The feasibility of the proposed process was tested in a series of release and injection experiments, which showed that the surface quality is not adversely affected by the introduction of a soft elastomer in the structure. We fabricated an elastomer SLM with an array of four by four micromirrors and demonstrated localized response. Analysis of the experimental results showed that patterning of the reflective multilayer, as well as its supporting nitride shell and electrode, is required for SLMs with pixel sizes of 1 by 1 /spl mu/m or less.