Title :
Elastomer spatial light modulators for extreme ultraviolet lithography
Author :
Wang, J.-S. ; Jung, I.W. ; Solgaard, O.
Author_Institution :
Edward L. Ginzton Lab., Stanford Univ., CA, USA
Abstract :
In this paper, we present an elastomer spatial light modulator (SLM) that can be scaled to meet the requirements of extreme ultraviolet (EUV- 13 nm wavelength) maskless lithography. The feasibility of the proposed process was tested in a series of release and injection experiments, which showed that the surface quality is not adversely affected by the introduction of a soft elastomer in the structure. We fabricated an elastomer SLM with an array of four by four micromirrors and demonstrated localized response. Analysis of the experimental results showed that patterning of the reflective multilayer, as well as its supporting nitride shell and electrode, is required for SLMs with pixel sizes of 1 by 1 /spl mu/m or less.
Keywords :
deformation; elastomers; electrodes; elemental semiconductors; micromirrors; molybdenum; optical fabrication; optical multilayers; reflectivity; silicon; spatial light modulators; ultraviolet lithography; 1 micron; 13 nm; Mo-Si; elastomer spatial light modulator; electrode; extreme ultraviolet maskless lithography; injection experiments; localized response; micromirror array; pixel sizes; reflective multilayer patterning; supporting nitride shell; surface quality; Electrodes; Lithography; Micromirrors; Mirrors; Nonhomogeneous media; Optical arrays; Optical imaging; Optical modulation; Pixel; Ultraviolet sources;
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7731-1
DOI :
10.1109/SENSOR.2003.1217051
