DocumentCode
1729172
Title
Fast atom beam-based fabrication of high-efficienct blazed grating using slanting angle control of a substrate
Author
Lee, ChaBum ; Hane, Kazuhiro ; Lee, Sun-Kyu
Author_Institution
Gwangju Inst. of Sci. & Technol., Gwangju, South Korea
fYear
2010
Firstpage
149
Lastpage
150
Abstract
This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6-1.5 μm in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively.
Keywords
coupled mode analysis; diffraction gratings; etching; optical fabrication; optical testing; silicon; FAB; Si; blazed grating; diffraction efficiency; electromagnetic analysis; fast atom beam etching; optical testing; rigorous coupled wave analysis; slanting angle control; Diffraction gratings; Etching; Fabrication; Gratings; Scanning electron microscopy; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics (OPT MEMS), 2010 International Conference on
Conference_Location
Sapporo
Print_ISBN
978-1-4244-8926-8
Electronic_ISBN
978-1-4244-8925-1
Type
conf
DOI
10.1109/OMEMS.2010.5672141
Filename
5672141
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