• DocumentCode
    1729324
  • Title

    Design and fabrication of an electrostatically actuated MEMS probe card

  • Author

    Shingo, K. ; Kataoka, K. ; Itoh, T. ; Suga, T.

  • Author_Institution
    Res. Center for Adv. Sci. & Technol., Tokyo Univ., Japan
  • Volume
    2
  • fYear
    2003
  • Firstpage
    1522
  • Abstract
    We have designed and fabricated a new type of MEMS probe card consisting of electrostatically-driven microprobes, which can be used for a next generation wafer probe card with the fritting-contact method. MEMS probe cards are requisite to higher pad-density and smaller pad-pitch chips, and are effective in high frequency testing. If a probe card consists of an array of actuator-integrated microprobes, it has some further advantages. Since the deflection of each probe can individually be controlled, probe-pad contact force can be uniform by compensating the probe-pad distance deviation with probe deflection. Furthermore, since contacts can directly be switched on and off, it could be suitable for a wafer-level test/burn-in probe card. To obtain a design guideline of actuator-integrated probes, we investigated the characteristics of fritting contact between electroplated Ni probes and Al electrodes. As a result, it has been found that both the contact and disconnection forces of Ni probes in fritting contact process could be as small as 10 /spl mu/N. We proposed a MEMS probe card that is composed of an array of Ni microcantilevers with a rolling-contact touch-mode electrostatic actuator and developed a micromachining process which includes electroplating deposition of two layers having different internal stress and etching of Cu sacrifice layer.
  • Keywords
    aluminium; copper; electroplating; electrostatic actuators; etching; micromachining; nickel; probes; Al; Al electrodes; Cu; Cu sacrifice layer; MEMS probe card; Ni; Ni microcantilevers; Ni probes; actuator-integrated microprobes array; electroplated Ni probes; electroplating deposition; electrostatically-driven microprobes; etching; fritting-contact method; internal stress; micromachining process; next generation wafer probe card; pad-density; pad-pitch chips; probe deflection; probe-pad contact force; probe-pad distance deviation; rolling-contact touch-mode electrostatic actuator; wafer-level test/burn-in probe card; Electrodes; Electrostatic actuators; Fabrication; Force control; Frequency; Guidelines; Micromachining; Micromechanical devices; Probes; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
  • Conference_Location
    Boston, MA, USA
  • Print_ISBN
    0-7803-7731-1
  • Type

    conf

  • DOI
    10.1109/SENSOR.2003.1217067
  • Filename
    1217067