• DocumentCode
    1729377
  • Title

    Thin gold to gold bonding for flip chip applications

  • Author

    Rohwer, Lauren E S ; Chu, Dahwey

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • fYear
    2011
  • Firstpage
    907
  • Lastpage
    910
  • Abstract
    We have demonstrated a solderless flip chip bonding process that utilizes electroless nickel/palladium, immersion gold pad metallization. This mask-less process enables higher interconnect densities than can be achieved with standard solder bump reflow. The thin (100nm) immersion gold surfaces were coated with dodecanethiol self-assembled monolayers. Strong gold to gold bonds were formed at 185°C with shear strengths that exceed Mil-Std 883 requirements. Gold stud bumps are also promising for flip chip applications, and can be bonded at 150°C when the gold surfaces are properly pre-treated - dilute piranha solution, argon plasma, and dodecanethiol SAM treatments work equally well.
  • Keywords
    flip-chip devices; gold; lead bonding; metallisation; monolayers; nickel alloys; palladium alloys; reflow soldering; self-assembly; Au; Ni-Pd; argon plasma; dilute piranha solution; dodecanethiol SAM treatments; dodecanethiol self-assembled monolayers; gold stud bumps; immersion gold pad metallization; maskless process; solder bump reflow; solderless flip chip bonding process; temperature 150 degC; temperature 185 degC; thermosonic gold wire bonding; Arrays; Bonding; Flip chip; Gold; Plasmas; Surface treatment; Wires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st
  • Conference_Location
    Lake Buena Vista, FL
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-61284-497-8
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2011.5898619
  • Filename
    5898619