DocumentCode :
1729540
Title :
High-frequency analog GNR-FET design criteria
Author :
Imperiale, Ilaria ; Gnudi, Antonio ; Gnani, Elena ; Reggiani, Susanna ; Baccarani, Giorgio
Author_Institution :
DEIS, Univ. of Bologna, Bologna, Italy
fYear :
2011
Firstpage :
303
Lastpage :
306
Abstract :
Some key aspects of the behavior of graphene nanoribbon (GNR) FETs for high-frequency analog applications are identified and discussed by means of a simulation study based on a full-quantum ballistic transport model. GNRs of width in the order of 10 nm are considered, where the small band-gap and the consequent leakage currents due to band-to-band-tunneling (BTBT) require a careful design. Simulations performed with a realistic model for source/drain metal contacts indicate that a proper choice of the drain doping profile can partially suppress BTBT currents. A 40-nm gate-length 2-nm SiO2 gate-dielectric GNR-FET can achieve a peak small-signal voltage gain of about 30 and a cut-off frequency well above 1 THz.
Keywords :
field effect transistors; graphene; nanostructured materials; band-to-band-tunneling; field effect transistors; full-quantum ballistic transport model; gate-dielectric GNR-FET; graphene nanoribbon; high-frequency analog GNR-FET design criteria; leakage currents; size 10 nm; size 2 nm; size 40 nm; source-drain metal contacts; Doping; Electric potential; FETs; Logic gates; Metals; Photonic band gap; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2011 Proceedings of the European
Conference_Location :
Helsinki
ISSN :
1930-8876
Print_ISBN :
978-1-4577-0707-0
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2011.6044174
Filename :
6044174
Link To Document :
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