• DocumentCode
    1729810
  • Title

    CMOS without doping: Midgap Schottky-barrier nanowire field-effect-transistors for high-temperature applications

  • Author

    Wessely, Frank ; Krauss, Tillmann ; Schwalke, Udo

  • Author_Institution
    Inst. for Semicond. Technol. & Nanoelectron., Darmstadt Univ. of Technol., Darmstadt, Germany
  • fYear
    2011
  • Firstpage
    263
  • Lastpage
    266
  • Abstract
    In this paper we report on a newly developed nanowire based field-effect device-architecture (NWFET) that can be used in high temperature environments. Our devices posess both high temperature stability and low OFF-state current. By changes in source/drain bias-polarity the electrical properties of the NW-devices can be tuned, whether the lowest possible leakage current, or maximum output current is desirable in a specific application.
  • Keywords
    CMOS integrated circuits; Schottky barriers; field effect transistors; nanowires; semiconductor doping; CMOS; NWFET; doping; high temperature stability; high-temperature applications; low OFF-state current; midgap Schottky-barrier nanowire field-effect-transistors; nanowire based field-effect device-architecture; Charge carriers; Doping; Fabrication; Silicon; Temperature; Temperature measurement; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference (ESSDERC), 2011 Proceedings of the European
  • Conference_Location
    Helsinki
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4577-0707-0
  • Electronic_ISBN
    1930-8876
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2011.6044184
  • Filename
    6044184