Title :
Large-size infrared reflow microlens based on stacked layers
Author :
Aonuma, Takuro ; Kumagai, Shinya ; Sasaki, Minoru
Author_Institution :
Dept. of Adv. Sci. & Technol., Toyota Technol. Inst., Nagoya, Japan
Abstract :
Large-size (~mm) reflow microlens is fabricated combining with UV curing process. Underlying stacked resist layers can assist the material movement of the photoresist in the reflow process generating the convex parabola shape. Stacking thickness shows the clear linearity. Infrared imaging performance is confirmed using 1.5 mm-diameter microlens.
Keywords :
curing; infrared imaging; microlenses; photoresists; UV curing; convex parabola shape; infrared imaging; large-size infrared reflow microlens; photoresist; size 1.5 mm; stacked layers; stacked resist layers; stacking thickness; Curing; Films; Lenses; Microoptics; Resists; Shape; Infrared microlens; Large-size; Stacked layer; UV-curing;
Conference_Titel :
Optical MEMS and Nanophotonics (OPT MEMS), 2010 International Conference on
Conference_Location :
Sapporo
Print_ISBN :
978-1-4244-8926-8
Electronic_ISBN :
978-1-4244-8925-1
DOI :
10.1109/OMEMS.2010.5672169
