Title :
Nanostructured origami™ folding of patternable resist for 3D lithography
Author :
Yang, Se Young ; Choi, Hyung-ryul Johnny ; Deterre, Martin ; Barbastathis, George
Author_Institution :
Massachusetts Inst. of Technol., Cambridge, MA, USA
Abstract :
A new method to fold free standing poly(methyl methacrylate) (PMMA) resist using e-beam exposure is developed and demonstrated. The results prove controllable folding of the patterned PMMA. An explanation of the folding mechanism is proposed based on experimental characterization and theoretical analysis. 3D lithography is achieved by attaching the patterned resist on an adjacent side wall by folding. Patterns are effectively transferred by depositing metal followed by a lift-off process.
Keywords :
electron beam effects; nanofabrication; nanolithography; nanopatterning; nanostructured materials; polymers; resists; 3D lithography; electron beam effects; fold free standing poly(methyl methacrylate); lift-off process; nanopatterning; nanostructured origami folding; patternable resist; Acceleration; Biomembranes; Lithography; Resists; Silicon; Surface charging; Three dimensional displays;
Conference_Titel :
Optical MEMS and Nanophotonics (OPT MEMS), 2010 International Conference on
Conference_Location :
Sapporo
Print_ISBN :
978-1-4244-8926-8
Electronic_ISBN :
978-1-4244-8925-1
DOI :
10.1109/OMEMS.2010.5672197
