DocumentCode :
1731194
Title :
Comparative study of circuit perspectives for multi-gate structures at sub-10nm node
Author :
Huguenin, J.-L. ; Lacord, J. ; Monfray, S. ; Coquand, R. ; Skotnicki, T. ; Ghibaudo, G. ; Boeuf, F.
Author_Institution :
ST Microelectron., Crolles, France
fYear :
2011
Firstpage :
107
Lastpage :
110
Abstract :
This work presents a comparative study between planar and vertical (FinFETs) multi-gate structures for 2017 ITRS specifications circuit perspectives. Propagation delays are simulated for inverter chain and NAND gate chain. Finally, the impact of the width is investigated on several design rules for FinFETs configurations.
Keywords :
MOSFET; logic gates; FinFET configuration; NAND gate chain; circuit perspectives; inverter chain; multigate structures; size 10 nm; Capacitance; FinFETs; Inverters; Logic gates; Propagation delay; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2011 Proceedings of the European
Conference_Location :
Helsinki
ISSN :
1930-8876
Print_ISBN :
978-1-4577-0707-0
Electronic_ISBN :
1930-8876
Type :
conf
DOI :
10.1109/ESSDERC.2011.6044223
Filename :
6044223
Link To Document :
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