DocumentCode :
1731367
Title :
Electron transport in nanoscale semiconductor devices: ballistic versus quasiballistic
Author :
Sano, Nobuyuki
Author_Institution :
Inst. of Appl. Phys., Tsukuba Univ., Japan
fYear :
2005
Firstpage :
58
Lastpage :
61
Abstract :
We have briefly reviewed our recent studies of quasi-ballistic transport in nanoscale semiconductor structures. It has been demonstrated both theoretically and numerically that the scattering in the channel is inevitable in most cases because of the singularity inherent in the BTE. Since the transport mechanism imposed in the ballistic and the quasi-ballistic is rather different, the ballistic picture of electron transport is somewhat misleading. Therefore, purely ballistic transport at room temperature may not be attained in most nanoscale MOS devices.
Keywords :
MOSFET; ballistic transport; electron transport theory; BTE; electron transport; nanoscale semiconductor devices; nanoscale semiconductor structures; quasiballistic transport; transport mechanism; Ballistic transport; Differential equations; Distribution functions; Electrons; MOSFETs; Nanoscale devices; Physics; Scattering; Semiconductor devices; Steady-state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 2005. (VLSI-TSA-Tech). 2005 IEEE VLSI-TSA International Symposium on
ISSN :
1930-8868
Print_ISBN :
0-7803-9058-X
Type :
conf
DOI :
10.1109/VTSA.2005.1497080
Filename :
1497080
Link To Document :
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