DocumentCode :
1731625
Title :
Ways of achieving high-performance MRAMs
Author :
Motoyoshi, M. ; Kano, H.
Author_Institution :
Technol. Dev. Group, Sony Corp., Atsugi, Japan
fYear :
2005
Firstpage :
82
Lastpage :
83
Abstract :
Recent MRAM developments and critical issues, such as universal memory requirements in the future, are discussed. Highly self-aligned techniques enable us to shrink cell size to the embedded-DRAM level. Toggle-mode MRAMs (L.Savtchenko et al. and M.Durlam et al., 2003) have a wide programming margin and a sufficiently small error rate for high-density memories, achieving cell stability. A large tunneling magnetoresistance (TMR) value is essential for high-speed read access, and MgO, as a tunnel barrier, promises to improve this drastically (W.H. Butler et al., 2001 and J. Mathon et al., 2001). The use of cladding bit lines (BLs) and word lines (WLs) has become a popular technique to reduce programming current. Moreover, adding an external magnetic field to a toggle-mode MRAM effectively reduces this. Finally, we briefly discuss spin transfer switching (STS) operation as a challenge to be faced in the future (J.C. Slonczewski, 1996).
Keywords :
DRAM chips; magnetic fields; magnetic storage; tunnelling magnetoresistance; cell stability; cladding bit lines; embedded-DRAM level; high-density memories; high-performance MRAM; high-speed read access; magnetic field; magnetic random access memory; programming current; self-aligned techniques; spin transfer switching operation; toggle-mode MRAM; tunnel barrier; tunneling magnetoresistance value; universal memory requirements; word lines; Information technology; Laboratories; Logic; Magnetic tunneling; Production; Random access memory; Read-write memory; Sociotechnical systems; Stability; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 2005. (VLSI-TSA-Tech). 2005 IEEE VLSI-TSA International Symposium on
ISSN :
1930-8868
Print_ISBN :
0-7803-9058-X
Type :
conf
DOI :
10.1109/VTSA.2005.1497089
Filename :
1497089
Link To Document :
بازگشت