Title :
Design and fabrication of a flow sensor detecting flow direction and velocity
Author :
Seunghyun Kim ; Sunghyun Kim ; Yongduk Kim ; Sieyoung Choi ; Sekwang Park
Author_Institution :
Dept. of Electr. Eng., Kyungpook Nat. Univ., Taegu, South Korea
Abstract :
A thermal flow sensor detecting flow direction and velocity at the same time is designed and fabricated using MEMS technology. Pt was used as resistive material because of its very stable physical properties. Only one heater at the center and four detectors surrounding it is necessary to work the flow sensor. Therefore, a flow sensor detecting flow direction and velocity was accomplished in a small dimension. An interface circuit was designed with popular instrumentation amplifiers, Wheatstone-bridge circuit and OP amps, and they are integrated into ASIC chips using CMOS technology. The maximum angle difference was 5/spl deg/ and velocity error was no more than 0.5 m/s. Power consumption was 50 mW and response time was a few seconds.
Keywords :
CMOS integrated circuits; application specific integrated circuits; flow measurement; microsensors; operational amplifiers; platinum; power consumption; velocity measurement; 50 mW; ASIC chips; CMOS technology; MEMS technology; Pt; Wheatstone bridge circuit; flow direction; flow velocity; instrumentation amplifier; interface circuit; operational amplifer; physical properties; power consumption; thermal flow sensor; velocity error; Application specific integrated circuits; CMOS technology; Detectors; Energy consumption; Fabrication; Instruments; Integrated circuit technology; Micromechanical devices; Operational amplifiers; Thermal sensors;
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7731-1
DOI :
10.1109/SENSOR.2003.1217169
