DocumentCode :
1732810
Title :
Formation of through aluminum via for noble metal PCB and packaging substrate
Author :
Park, Jung Kyu ; Lee, Young Ki ; Choi, Seung Hwan ; Shin, Sang Hyun ; Choi, Myoung Soo
Author_Institution :
IT&C R&D Team, Samsung LED, Suwon, South Korea
fYear :
2011
Firstpage :
1787
Lastpage :
1790
Abstract :
Aluminum oxide provides high impedance insulation layer on the surface of the aluminum (alloy) body and many 1-dimensional PCBs or module arrays based upon aluminum anodization have been proposed. However 3-dimensional packages or modules can hardly be found. This mismatch is because reliable vertical interconnection through aluminum i.e. `through aluminum via´ (TVA) has not been established. Due to the volumetric expansion during the oxidation of Al to Al2O3, it has been believed preventing cracks in the vicinity of sharp edges is hardly possible. In this paper, we will introduce a vertically conductive `through aluminum via´ (TAV) that can be made by aluminum anodization and industry standard PCB manufacturing process. With this structure, we succeeded in constructing an `anodized metal substrate´ (AMS) that has supremacy in thermal conductivity, long term reliability and cost effectiveness. The manufacturing process of the substrate was almost identical to that of standard PCB except anodizing process; Mechanical drilling or etching to make the vias, anodizing to form an electrical insulation layer on the whole surface of aluminum plate including the inside wall of the vias, metal layer deposition on the anodized surface by sputtering and electro plating, and patterning by chemical etching. The two key processes are the anodization and metallization of the anodized surface. The electrolytes for anodization contained complex acidic solutions. Industry-standard soft anodizing procedure at room temperature was used and the thickness of the oxidation layer was about 30~40 um. Adhesion metal and copper directly on the anodized surface were deposed by inline sputter. Average electrical resistance between the pads that include the vias was over 100 mega ohm at 250 V and the yield rate was over 90 %. AMS is thermally ideal for its high thermal conductivity of aluminum and aluminum oxide and the cost effectiveness is very high for its material cos- - t and process cost.
Keywords :
adhesion; anodisation; circuit reliability; electronics packaging; metallisation; oxidation; printed circuit manufacture; thermal conductivity; 3-dimensional packages; PCB manufacturing; adhesion metal; aluminum anodization; aluminum oxide; anodized metal substrate; cost effectiveness; electrical insulation layer; high impedance insulation layer; long term reliability; metallization; noble metal PCB; oxidation; packaging substrate; reliable vertical interconnection; thermal conductivity; through aluminum via; volumetric expansion; Aluminum; Insulation; Light emitting diodes; Substrates; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st
Conference_Location :
Lake Buena Vista, FL
ISSN :
0569-5503
Print_ISBN :
978-1-61284-497-8
Electronic_ISBN :
0569-5503
Type :
conf
DOI :
10.1109/ECTC.2011.5898755
Filename :
5898755
Link To Document :
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