DocumentCode :
1732896
Title :
Development of a non-conductive, no-flow wafer level underfill
Author :
Su, Chan-Lu ; Yeh, Kuo Yu ; Lin, Chang Chih
Author_Institution :
Powertech Technol. Inc., Hsinchu, Taiwan
fYear :
2011
Firstpage :
1800
Lastpage :
1804
Abstract :
WLCSP (wafer level chip scale package) has been developed for several years to reduce package size, process cost and to increase product reliability. With the development of high-density, flip chip packages, an underfill process for fine-pitch bump size become more important. WLUF (wafer level underfill) is a technology that applies an underfill material onto a wafer front side and encapsulates the flip chip package without the need for capillarity flow and flux dispensing. Thus, voids from capillarity flow may be avoided and flux-dispensing process is eliminated to prevent potential reliability risks resulting from residual fluxes. In this study, we describe the investigation of a new WLUF technology for fine pitch WLCSP packages and present the lamination and bonding test results using the WLUF materials on our test WLCSP packages.
Keywords :
flip-chip devices; semiconductor device reliability; wafer level packaging; capillarity flow; fine-pitch bump size; flip chip package; flux-dispensing process; no-flow wafer level underfill; nonconductivev wafer level underfill; product reliability; reliability risk; underfill material; wafer front side; wafer level chip scale package; Bonding; Films; Flip chip; Lamination; Substrates; Vehicles;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st
Conference_Location :
Lake Buena Vista, FL
ISSN :
0569-5503
Print_ISBN :
978-1-61284-497-8
Electronic_ISBN :
0569-5503
Type :
conf
DOI :
10.1109/ECTC.2011.5898758
Filename :
5898758
Link To Document :
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