DocumentCode
1733037
Title
Basic experimental results of MCEBPS
Author
Kim, T.Y. ; Chung, K.H. ; Kang, Y.B. ; Ko, D.K. ; Jung, J.K. ; Noh, S.J.
Author_Institution
Seoul Nat. Univ., South Korea
fYear
1997
Firstpage
143
Abstract
Summary form only given. The conceptual design and the basic experiment of the Multi-Cathode Electron Beam Plasma Source (MCEBPS) were carried out. The MCEBPS can efficiently produce uniform and dense plasmas through direct interaction of electrons and neutral gases in the wide area with a diameter of 300 mm or above. The nonuniformity of the radial plasma density must be within /spl plusmn/3% to be suitable for the processing of next generation semiconductor devices.
Keywords
cathodes; electron beam effects; plasma collision processes; plasma confinement; plasma density; plasma production; plasma-beam interactions; 50 to 200 eV; LaB/sub 6/; conceptual design; dense plasmas; electrons; multi-cathode electron beam plasma source; neutral gase; next generation semiconductor devices; nonuniformity; radial plasma density; uniform plasma; Cathodes; Electron beams; Gases; Hydrogen; Plasma chemistry; Plasma confinement; Plasma density; Plasma measurements; Plasma sources; Plasma temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location
San Diego, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3990-8
Type
conf
DOI
10.1109/PLASMA.1997.604430
Filename
604430
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