Title :
Basic experimental results of MCEBPS
Author :
Kim, T.Y. ; Chung, K.H. ; Kang, Y.B. ; Ko, D.K. ; Jung, J.K. ; Noh, S.J.
Author_Institution :
Seoul Nat. Univ., South Korea
Abstract :
Summary form only given. The conceptual design and the basic experiment of the Multi-Cathode Electron Beam Plasma Source (MCEBPS) were carried out. The MCEBPS can efficiently produce uniform and dense plasmas through direct interaction of electrons and neutral gases in the wide area with a diameter of 300 mm or above. The nonuniformity of the radial plasma density must be within /spl plusmn/3% to be suitable for the processing of next generation semiconductor devices.
Keywords :
cathodes; electron beam effects; plasma collision processes; plasma confinement; plasma density; plasma production; plasma-beam interactions; 50 to 200 eV; LaB/sub 6/; conceptual design; dense plasmas; electrons; multi-cathode electron beam plasma source; neutral gase; next generation semiconductor devices; nonuniformity; radial plasma density; uniform plasma; Cathodes; Electron beams; Gases; Hydrogen; Plasma chemistry; Plasma confinement; Plasma density; Plasma measurements; Plasma sources; Plasma temperature;
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-3990-8
DOI :
10.1109/PLASMA.1997.604430
