DocumentCode :
1734544
Title :
Efficiently Performing Yield Enhancements by Identifying Dominant Physical Root Cause from Test Fail Data
Author :
Sharma, Manish ; Benware, Brady ; Ling, Lei ; Abercrombie, David ; Lee, Lincoln ; Keim, Martin ; Tang, Huaxing ; Cheng, Wu-Tung ; Tai, Ting-Pu ; Chang, Yi-Jung ; Lin, Reinhart ; Man, Albert
Author_Institution :
Mentor Graphics Corp., Wilsonville, OR
fYear :
2008
Firstpage :
1
Lastpage :
9
Abstract :
Yield enhancements in the manufacturing process today require an expensive, long and tedious physical failure analysis process to identify the root cause. In this paper we present Axiom, a new technique geared towards efficiently identifying a single dominant defect mechanism (for example in an excursion wafer) by analyzing fail data collected from the production test environment. Axiom utilizes statistical hypothesis testing in a novel way to analyze logic diagnosis data along with information on physical features in the design layout and reliably identify the dominant cause for yield loss. This new methodology was validated by applying it to a single excursion wafer produced on a 90 nm process, in which the dominant failing physical feature was correctly identified.
Keywords :
integrated circuit layout; integrated circuit testing; integrated circuit yield; design layout; manufacturing process; single excursion wafer; statistical hypothesis testing; test fail data; yield enhancements; Data analysis; Fabrication; Failure analysis; Graphics; History; Logic design; Logic testing; Manufacturing processes; Performance evaluation; Production;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Test Conference, 2008. ITC 2008. IEEE International
Conference_Location :
Santa Clara, CA
ISSN :
1089-3539
Print_ISBN :
978-1-4244-2402-3
Electronic_ISBN :
1089-3539
Type :
conf
DOI :
10.1109/TEST.2008.4700589
Filename :
4700589
Link To Document :
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