Title :
Generic fabrication technology for transparent and suspended microfluidic and nanofluidic channels
Author :
Hug, Thomas S. ; Biss, Thilo ; De Rooij, Ncio F. ; Staufer, U.
Author_Institution :
Inst. of Microtechnology, Neuchatel, Switzerland
Abstract :
A promising method for fabricating suspended and transparent microfluidic and nanofluidic channels systems made of a thermally grown silicon dioxide is presented. The fabrication is based on the growth of a thermal silicon dioxide in open cavities formed at the interface of two wafers. We demonstrate three different designs of micro- and nanofluidic channels for three applications: 1) Electroosmotic flow measurements through micro- and nanofluidic channel systems were used to estimate the electroosmotic mobility. 2) Resonance measurements on suspended and filled, 100 μm long microchannels were optically performed by using 10 × 10 μm large, integrated and aluminum coated silicon dioxide mirrors. 3) Hollow cantilevers with a FIB-milled pore at the tip apex were fabricated and used to record scanning force microscopy images.
Keywords :
aluminium; coatings; crystal growth; electrophoresis; microfluidics; nanotechnology; photolithography; potassium compounds; resonance; semiconductor growth; silicon compounds; sputter etching; 10 micron; 100 micron; Al; KOH; electroosmotic flow measurement; electroosmotic mobility; fabrication technology; focused ion beam; hollow cantilever; integrated optics; microfluidic channel; nanofluidic channel; open cavity; oscillating channel; resonance measurement; scanning force microscopy; silicon dioxide mirror; suspended channel; thermally grown silicon dioxide; transparent channel; Fabrication; Fluid flow measurement; Force measurement; Image motion analysis; Integrated optics; Microchannel; Microfluidics; Optical design; Resonance; Silicon compounds;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN :
0-7803-8994-8
DOI :
10.1109/SENSOR.2005.1497291