Abstract :
Presents the table of contents of the proceedings.
Keywords :
Annealing; CMOS process; CMOS technology; Chemical technology; Doping; Implants; Ion implantation; Plasma applications; Plasma immersion ion implantation; Plasma simulation;
Conference_Titel :
Junction Technology, 2008. IWJT '08. Extended Abstracts - 2008 8th International workshop on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1737-7
DOI :
10.1109/IWJT.2008.4540003
