DocumentCode :
1735485
Title :
Optimal design of inductively coupled plasma torch using parametric study and design sensitivity analysis
Author :
Seo, Jae Hyun ; Kim, Kwang Soon ; Hong, Seung Ho
Author_Institution :
Seoul Nat. Univ., South Korea
fYear :
2001
Firstpage :
293
Abstract :
Summary form only given, as follows. A parametric study and a design sensitivity analysis have been carried out to find the optimal design conditions and thermal plasma configurations of an Inductively Coupled Plasma (ICP) torch. Firstly, the parametric study is conducted with the following criteria on thermal plasma properties; i) sufficiently high temperature ( > 8000 K), ii) a large volume of hot temperature, and iii) no recirculating flow near the torch inlet. Next, the sensitivity of plasma temperature distributions is derived from the results of parametric study by estimating the optimal ranges of parameters and giving the initial guessing values for the sensitivity analysis. The derived sensitivity of plasma temperature distributions is analyzed using the gradient method for the thermal plasma configurations to produce the broader hot region and more uniform temperature distributions. Finally, these two results are compared, and the optimum design values for ICP torches of 15 kW usable for material processing are presented.
Keywords :
plasma diagnostics; plasma materials processing; plasma temperature; plasma torches; sensitivity analysis; temperature distribution; 15 kW; 8000 K; ICP torches; design sensitivity analysis; gradient method; hot region; hot temperature; inductively coupled plasma torch; initial guessing values; material processing; optimal design; optimal design conditions; optimal parameter ranges; optimum design values; parametric study; plasma temperature distributions; sensitivity; sensitivity analysis; thermal plasma configurations; thermal plasma properties; torch inlet; uniform temperature distributions; Gradient methods; Materials processing; Parametric study; Plasma materials processing; Plasma properties; Plasma temperature; Sensitivity analysis; Temperature distribution; Temperature sensors; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
Type :
conf
DOI :
10.1109/PPPS.2001.960951
Filename :
960951
Link To Document :
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