DocumentCode
1735767
Title
Thin oxide limits
Author
Vincent, Emmanuel ; Suehle, John S.
Author_Institution
STMicroclectronics
fYear
1999
fDate
6/21/1905 12:00:00 AM
Firstpage
134
Lastpage
135
Keywords
Acceleration; Carbon capture and storage; Circuit testing; Design for quality; Electric breakdown; High-K gate dielectrics; Laboratories; Physics; Semiconductor device manufacture; Semiconductor device noise;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 1999. IEEE International
Print_ISBN
0-7803-5649-7
Type
conf
DOI
10.1109/IRWS.1999.830575
Filename
830575
Link To Document