DocumentCode :
1735815
Title :
Electromigration
Author :
Sullivan, Timothy
Author_Institution :
IBM Microelectronics
fYear :
1999
fDate :
6/21/1905 12:00:00 AM
Firstpage :
136
Lastpage :
137
Keywords :
Electromigration; Guidelines; Life estimation; Manufacturing; NIST; Qualifications; Rivers; Stress; Temperature; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 1999. IEEE International
Print_ISBN :
0-7803-5649-7
Type :
conf
DOI :
10.1109/IRWS.1999.830576
Filename :
830576
Link To Document :
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