DocumentCode
1735831
Title
Analysis and improvement on the uniformity of sheet resistance of nickel silicide
Author
Tomita, Ryuji ; Yasuda, Makoto ; Kimura, Hiroshi ; Maeda, Kazutaka ; Ueno, Shuichiro ; Moritoki, Masashige
Author_Institution
Process Technol. Div., NEC Electron. Corp., Sagamihara
fYear
2008
Firstpage
162
Lastpage
163
Abstract
Furnace anneal for the first anneal dramatically improves the uniformity of the sheet resistance of nickel silicide at small area. The main cause of the deterioration in the uniformity of the sheet resistance is not the crystalline state or the implanted impurities but the size of the pattern which nickel silicide is formed at.
Keywords
annealing; electric resistance; nickel compounds; NiSi; Si; crystalline state; furnace anneal; nickel silicide; sheet resistance; Annealing; Conductivity; Crystallization; Electrical resistance measurement; Impurities; National electric code; Nickel; Silicides; Silicon; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Junction Technology, 2008. IWJT '08. Extended Abstracts - 2008 8th International workshop on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-1737-7
Electronic_ISBN
978-1-4244-1738-4
Type
conf
DOI
10.1109/IWJT.2008.4540040
Filename
4540040
Link To Document