DocumentCode :
1735874
Title :
Investigation of InP/InGaAs Double Heterojunction Bipolar Transistor (DHBT) with a step-graded InAlGaAs/InP collector structure
Author :
Chen, Tzu-Pin ; Chen, Wei-Hsin ; Chu, Kuei-Yi ; Chen, Li-Yang ; Lee, Chi-Jhung ; Cheng, Shiou-Ying ; Tsai, Jung-Hui ; Liu, Wen-Chau
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan
fYear :
2008
Firstpage :
168
Lastpage :
171
Abstract :
An interesting InP/InGaAs double heterojunction bipolar transistor (DHBT) with a step-graded InAlGaAs/InP collector structure are demonstrated and studied. By use of the step-graded InAlGaAs/InP collector structure at the base-collector heterojunction, the current blocking effect is effectively eliminated. Experimentally, the studied device shows a relatively better common-emitter breakdown voltage and low output conductance though at high temperature. Also, the studied device shows a wider collector current density operation region which over 11 decades in magnitude of collector current density (10~6 to 105 A/cm2). Moreover, the studied device also shows the relatively weaker temperature dependence on the electron impact ionization alpha. Consequently, the studied DHBT device provides the promise for low-voltage and low-power circuit applications.
Keywords :
III-V semiconductors; aluminium compounds; current density; electron impact ionisation; gallium arsenide; heterojunction bipolar transistors; indium compounds; InAlGaAs-InP; InP-InGaAs; common-emitter breakdown voltage; current blocking effect; current density; double heterojunction bipolar transistor; electron impact ionization; output conductance; step-graded collector structure; Current density; DH-HEMTs; Double heterojunction bipolar transistors; Electric breakdown; Electrons; Impact ionization; Indium gallium arsenide; Indium phosphide; Photonic band gap; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Junction Technology, 2008. IWJT '08. Extended Abstracts - 2008 8th International workshop on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1737-7
Electronic_ISBN :
978-1-4244-1738-4
Type :
conf
DOI :
10.1109/IWJT.2008.4540042
Filename :
4540042
Link To Document :
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