The vacuum spark point source (VSX 6a) for X-ray lithography

Summary form only given. The technology of X-ray point plasma sources is taking over the role that previously was retained by the multiple beam synchrotron as radiation source for submicron lithography. A Plasma Point Source System (VSX-6A) has been designed by our Company ALFT, Inc. as an entrance tool for Universities or other Research laboratories working in the semiconductor field. The VSX-6A is essentially a miniature discharge capable of emitting soft X-ray radiation. Because the radiation is emitted in small doses in each spark, it is necessary to repeat the phenomenon at high frequency in order to have a quasi-continuous wave. The soft X-ray power distribution is then uniform, thus meeting the requirement for microlithography. The output of the VSX-6A is 200 mW of 0.93 keV radiation (/spl sim/14 angstroms) in the copper line, emitted continuously and reliably. Our plan is to increase the power level to 1 W for a low volume market that will require performance of 1 Wafer Layer per Hour (WLPH) or less, and then scale the device to eventually reach the silicon market that requires 20 WLPH. We expect to be able to support R&D and low volume applications such as Military Communication GaAs Chips by mid-year. A demonstration system in California will be available at that time.