• DocumentCode
    1737844
  • Title

    Silicon technology: from submicron dimensions to large areas

  • Author

    Beenakker, C.I.M.

  • Author_Institution
    Delft Inst. of Microelectron. & Submicrontechnol., Netherlands
  • fYear
    1999
  • fDate
    22-24 Nov. 1999
  • Firstpage
    3
  • Abstract
    Summary form only given. The need for cheaper and faster logic and memory integrated circuits is a strong push in the development of silicon technology to enable smaller minimal dimensions on the chip. On the other hand, the silicon technology as used in micro-systems, high frequency semiconductors and large area devices such as TFT displays and solar cells is rather driven by factors such as the need for IC process compatibility, low temperature processing and less common materials. In this presentation, the technological challenges in the various areas are indicated and common trends identified. It is then shown that a combination of the different technologies leads to unique system solutions.
  • Keywords
    elemental semiconductors; integrated circuit technology; large screen displays; liquid crystal displays; micromechanical devices; semiconductor technology; silicon; solar cells; thin film transistors; IC process compatibility; Si; TFT displays; chip dimensions; high frequency semiconductors; large area devices; logic integrated circuits; low temperature processing; memory integrated circuits; micro-systems; silicon technology; solar cells; Displays; Frequency; Integrated circuit technology; Logic circuits; Logic devices; Photovoltaic cells; Semiconductor materials; Silicon; Temperature; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics, 1999. ICM '99. The Eleventh International Conference on
  • Print_ISBN
    0-7803-6643-3
  • Type

    conf

  • DOI
    10.1109/ICM.2000.884792
  • Filename
    884792