DocumentCode
1739288
Title
Low threshold current operation of 1.3 μm BH laser diodes with self-defined AlInAs-oxide current-confinement layer
Author
Ko, Hyun-Chul ; Nakamura, Takahiro ; Koui, Tomoaki ; Suzuki, Naofumi ; Terakado, Tomoji ; Kobayashi, Kaoru
Author_Institution
Syst. Devices & Fudamental Res., NEC Corp., Shiga, Japan
Volume
1
fYear
2000
fDate
2000
Firstpage
129
Abstract
A self-defined oxide-aperture structure combined with a buried heterostructure (BH) fabricated by simple process is strongly required from the viewpoint of low threshold current, mode control, run-to-run reproducibility, and in-plane uniformity of laser characteristics. A novel structure of 1.3 μm BH laser diodes with a self-defined AlInAs-oxide current-blocking layer is proposed and successfully demonstrated. The oxidation of AlInAs was automatically stopped near the active layer buried in InP. This resulted in the lowest threshold current operation ever reported in oxide-confined long wavelength laser diodes, to our best knowledge
Keywords
III-V semiconductors; aluminium compounds; buried layers; current density; etching; gallium arsenide; indium compounds; oxidation; quantum well lasers; 1.3 micron; AlInAs; BH laser diodes; InGaAsP; MQW active layer; buried active layer; in-plane uniformity; low threshold current operation; mode control; oxidation; oxide current-confinement layer; oxide-confined long wavelength LD; run-to-run reproducibility; selective etching; self-defined oxide-aperture structure; Diode lasers; Etching; Insulation; Laser modes; Optical buffering; Optical surface waves; Surface emitting lasers; Temperature distribution; Threshold current; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society 2000 Annual Meeting. LEOS 2000. 13th Annual Meeting. IEEE
Conference_Location
Rio Grande
ISSN
1092-8081
Print_ISBN
0-7803-5947-X
Type
conf
DOI
10.1109/LEOS.2000.890708
Filename
890708
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