DocumentCode
1741983
Title
Ultrafast x ray diffraction
Author
Cavalleri, A. ; Siders, C.W. ; Toth, C. ; Squier, J.A. ; Barty, C.P.J. ; Wilson, K.R. ; Sokolowski-Tinten, K. ; von der Linde, D. ; Kammler, M. ; Horn von Hoegen, M.
Author_Institution
Dept. of Chem. & Biochem., California Univ., San Diego, La Jolla, CA, USA
fYear
2000
fDate
12-12 May 2000
Firstpage
188
Abstract
Summary form only given. Many fundamental processes in physics, such as heat transport and phase transitions in solids involve movement of the constituent atoms. Such changes cannot be directly measured with visible light and occur transiently on time-scales comparable with the natural oscillation periods of atoms (femtoseconds to picoseconds). In this paper, we present experiments on crystalline semiconductors irradiated with short visible pulses in two fluence regimes.
Keywords
III-V semiconductors; X-ray diffraction; high-speed optical techniques; laser beam effects; optical films; Ge; constituent atom; crystalline semiconductors; fluence regimes; fundamental processes; heat transport; natural oscillation period; phase transitions; physics; short visible pulses; solids; time-scales; ultrafast x ray diffraction; Conductors; Optical films; Optical pulses; Optical pumping; Optical sensors; Plasma measurements; Pulse measurements; Solids; Ultrafast optics; X-ray diffraction;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 2000. (QELS 2000). Technical Digest
Conference_Location
San Francisco, CA, USA
ISSN
1094-5695
Print_ISBN
1-55752-608-7
Type
conf
Filename
901962
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