Quantum interferometric lithography: exploiting entanglement to beat the diffraction limit

Summary form only given. It has been known for some time that entangled photon pairs, such as generated by spontaneous parametric down conversion, have unusual imaging characteristics with sub-shot-noise interferometric phase measurement. In fact, Fonseca, et al., recently demonstrated resolution of a two-slit diffraction patterned at half the Rayleigh limit in a coincidence counting experiment. What we show is that this type of effect is possible not only in coincidence counting experiments, but also in real two-photon absorbing systems, such as those used in classical interferometric lithography. In particular, we will demonstrate that quantum entanglement is the resource that allows sub-diffraction limited lithography.