DocumentCode :
1742468
Title :
Influences of pad shape and solder microstructure on shear force of low cost flip chip bumps
Author :
Cai, Jian ; Law, Simon ; Teng, Annette ; Chan, Philip C.H.
Author_Institution :
Computer Aided Design & Manuf. Facility, Hong Kong Univ. of Sci. & Technol., China
fYear :
2000
fDate :
2000
Firstpage :
91
Lastpage :
98
Abstract :
The bumping process plays a critical role in flip chip technology. A low cost bumping process has been developed using electroless nickel and immersion gold followed by stencil printing. The process flow is described in this paper. The Al pad size is about 100 μm in diameter with a pitch of 400 μm. Different electroless plating solutions were evaluated and different solder pastes were used to evaluate the stencil printing process. Different pad shapes were also tested for shear strength. Ni studs with no bump material were fabricated to evaluate the electroless process. The shear force test result shows a strength value of 230 MPa for Ni studs. The solder bump after reflow has a diameter of 160 μm and a height of 120 μm. There is some difference in the shear force test results for different pad shapes. SEM and EDAX results of the fracture surface indicate that the fracture was cohesive or inside the solder. Cross sections showed some intermetallic layers at the interface. A Ni-Sn intermetallic layer and a phosphorus rich layer formed during reflow, which have compositions of Ni3Sn4 and Ni3P respectively. The low cost flip chip samples were subjected to multiple reflows and shear force tests were performed. Fracture surfaces were analysed and failure modes were differentiated
Keywords :
X-ray chemical analysis; crystal growth from solution; electroless deposition; failure analysis; flip-chip devices; fracture; integrated circuit interconnections; integrated circuit metallisation; integrated circuit packaging; interface structure; mechanical testing; microassembling; reflow soldering; scanning electron microscopy; shear strength; 100 micron; 120 micron; 160 micron; 400 micron; Al; Al pad pitch; Al pad size; EDAX; Ni studs; Ni-Au; Ni-Sn intermetallic layer; Ni3P; Ni3P layer; Ni3Sn4; Ni3Sn4 layer; SEM; bump material; bumping process; bumping process cost; cohesive fracture; electroless nickel; electroless plating solutions; electroless process; failure modes; flip chip bumps; flip chip technology; fracture surface; fracture surfaces; immersion gold; interface intermetallic layers; multiple reflows; pad shape; pad shapes; phosphorus rich layer; process flow; reflow solder bump; shear force; shear force test; shear strength; solder bump diameter; solder bump height; solder cross sections; solder microstructure; solder pastes; stencil printing; stencil printing process; Costs; Flip chip; Gold; Intermetallic; Microstructure; Nickel; Printing; Shape; Surface cracks; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Materials and Packaging, 2000. (EMAP 2000). International Symposium on
Conference_Location :
Hong Kong
Print_ISBN :
0-7803-6654-9
Type :
conf
DOI :
10.1109/EMAP.2000.904138
Filename :
904138
Link To Document :
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