DocumentCode :
1742482
Title :
Microstructure and adhesion strength of copper substrate after oxidation with a newly developed chemical solution
Author :
Xinyong Fan ; Chan, Eric ; Yuen, John ; Lam, Angus ; Fan, Nelson ; Wu, Jingshen ; Weng, Lutao ; Mclellan, Neil
Author_Institution :
Dept. of Mech. Eng., HKUST, Kowloon, China
fYear :
2000
fDate :
2000
Firstpage :
220
Lastpage :
223
Abstract :
In this study, the surface of copper packaging substrates was treated by two newly developed black oxidizing solutions, which contain no environmentally hazardous chemicals, and do not contaminate silver or gold structures on the substrate. Compared with the substrate treated by some commercially available oxidizing solutions, the new solutions can produce oxidized substrates with much fewer loose particles. The microstructure of the treated substrates was examined by SEM, XRD, XPS and Auger spectroscopy. The adhesion strength of the copper substrates treated with the commercial solutions and the newly developed ones were tested and compared. Substrate surface condition after oxidation was checked using SEM
Keywords :
Auger electron spectra; X-ray diffraction; adhesion; copper; crystal microstructure; integrated circuit packaging; oxidation; scanning electron microscopy; surface structure; surface treatment; Ag-Cu; Au-Cu; Auger spectroscopy; Cu; CuOCu2O-Cu; SEM; XPS; XRD; adhesion strength; black oxidizing solution treatment; chemical solution; copper packaging substrate surface; copper substrate; copper substrates; environmentally hazardous chemicals; gold structure contamination; loose particles; microstructure; oxidation; oxidized substrates; oxidizing solutions; silver structure contamination; substrate surface condition; substrate treatment; treated substrate microstructure; Adhesives; Chemical hazards; Copper; Gold; Microstructure; Packaging; Silver; Surface contamination; Surface treatment; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Materials and Packaging, 2000. (EMAP 2000). International Symposium on
Conference_Location :
Hong Kong
Print_ISBN :
0-7803-6654-9
Type :
conf
DOI :
10.1109/EMAP.2000.904158
Filename :
904158
Link To Document :
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