DocumentCode :
1744302
Title :
Silicon concentrator cells by low cost process
Author :
Araki, Kenji ; Yamaguchi, Masafumi
Author_Institution :
Toyota Technol. Inst., Nagoya, Japan
fYear :
2000
fDate :
2000
Firstpage :
164
Lastpage :
167
Abstract :
A new Si concentrator cell was proposed and developed. In this novel approach, a single step photolithography process is described which includes superfine random pyramid texture, with the electrode directly defined onto the textured surface. Additionally, improved electrode design was applied, allowing for operation under nonuniform surface voltage and current density, experienced during high concentrator conditions. This has lead to energy conversion efficiencies in excess of 19%
Keywords :
current density; elemental semiconductors; photolithography; point contacts; silicon; solar cells; solar energy concentrators; surface texture; 19.3 percent; 4 mm; Si; Si concentrator solar cell; electrode definition; energy conversion efficiency; high concentrator conditions; low-cost manufacturing process; nonuniform surface current density; nonuniform surface voltage; single step photolithography process; superfine random pyramid texture; textured surface; Costs; Electrodes; Fingers; Lithography; Optical films; Photovoltaic cells; Research and development; Silicon; Surface texture; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE
Conference_Location :
Anchorage, AK
ISSN :
0160-8371
Print_ISBN :
0-7803-5772-8
Type :
conf
DOI :
10.1109/PVSC.2000.915779
Filename :
915779
Link To Document :
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