Silicon concentrator cells by low cost process

Author

Araki, Kenji ; Yamaguchi, Masafumi

Author_Institution

Toyota Technol. Inst., Nagoya, Japan

fYear

2000

fDate

2000

Firstpage

164

Lastpage

167

Abstract

A new Si concentrator cell was proposed and developed. In this novel approach, a single step photolithography process is described which includes superfine random pyramid texture, with the electrode directly defined onto the textured surface. Additionally, improved electrode design was applied, allowing for operation under nonuniform surface voltage and current density, experienced during high concentrator conditions. This has lead to energy conversion efficiencies in excess of 19%

Keywords

current density; elemental semiconductors; photolithography; point contacts; silicon; solar cells; solar energy concentrators; surface texture; 19.3 percent; 4 mm; Si; Si concentrator solar cell; electrode definition; energy conversion efficiency; high concentrator conditions; low-cost manufacturing process; nonuniform surface current density; nonuniform surface voltage; single step photolithography process; superfine random pyramid texture; textured surface; Costs; Electrodes; Fingers; Lithography; Optical films; Photovoltaic cells; Research and development; Silicon; Surface texture; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE

Conference_Location

Anchorage, AK

ISSN

0160-8371

Print_ISBN

0-7803-5772-8

Type

conf

DOI

10.1109/PVSC.2000.915779

Filename

915779